Analyzing the characteristics of CVD process, the main calculation in quantum chemistry methods was introduced.
本文分析了化学气相沉积过程的特点，并对量子化学计算的主要方法进行介绍。
To study the reaction mechanism of CVD (chemical vapor deposition) reaction system, quantum chemistry methods are proved highly potential.
量子化学方法在研究化学气相沉积反应体系的反应机理、动力学计算方面有很大的潜力。
Then, the current situation of applying quantum chemistry methods to the elementary processes in gas phase and on surface were reviewed and discussed.
在此基础上，针对气相和表面基元过程的量子化学研究现状进行总结和评述。
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